Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation
- M.S. Crowder
- 2019
- JES
Paper
Publications
24860 results for Exploratory Science
Electrodeposition of Nickel-Iron Alloys: 1. Effect of Agitation
- P.C. Andricacos
- C. Arana
- et al.
- 2019
- JES
PaperSelective Wet and Dry Etching of Hydrogenated Amorphous Silicon and Related Materials
- I. Haller
- Y.H. Lee
- et al.
- 2019
- JES
PaperCalculation of Galvanic Currents and Potentials Using a p-Type Finite Element Method
- R.B. Morris
- 2019
- JES
PaperDopant Segregation in CZ and MCZ Silicon Crystal Growth: A Comparison Between Experiment and Numerical Simulation
- K.M. Kim
- W.E. Langlois
- 2019
- JES
PaperInterfacial reaction between Ni and MBE-Grown SiGe alloy
- R.D. Thompson
- K.N. Tu
- et al.
- 2019
- JES
PaperOxidation of Plasma-Deposited α-SixC1-x:H Films
- J.M. Eldridge
- J.O. Moore
- et al.
- 2019
- JES
PaperRemoval of Fluorocarbon Residues on CF4/H2 Reactive-ion-Etched Silicon Surfaces Using a Hydrogen Plasma
- J. Simko
- G.S. Oehrlein
- et al.
- 2019
- JES
PaperSimulation of Leveling in Electrodeposition
- John O. Dukovic
- Charles W. Tobias
- 2019
- JES
PaperCurrent status of reduced temperature silicon epitaxy by chemical vapor deposition
- B.S. Meyerson
- 2019
- JES
Paper