Comparison of scalar and vector diffraction modelling for deep-UV lithography
- Bruce W. Smith
- Donis G. Flagello
- et al.
- 1993
- Microlithography 1993
Conference paper
Publications
3608 results for Mathematical Sciences
Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
Conference paperA tetrahedral interpolation technique for color space conversion
- James M. Kasson
- Wil Plouffe
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperProcess optimization of APEX-E
- Karen Petrillo
- 1993
- Microlithography 1993
Conference paperDevelopments in 2D AFM metrology
- Diana Nyyssonen
- 1993
- Microlithography 1993
Conference paperOptimal estimation of linear operators from inaccurate data: A second look
- Charles A. Micchelli
- 1993
- Numerical Algorithms
PaperCovering the complete graph with plane cycles
- Alan Hartman
- Yoav Medan
- 1993
- Discrete Applied Mathematics
PaperMonge and feasibility sequences in general flow problems
- Ilan Adler
- Alan J. Hoffman
- et al.
- 1993
- Discrete Applied Mathematics
PaperIrredundancy in circular arc graphs
- Martin Charles Golumbic
- Renu C. Laskar
- 1993
- Discrete Applied Mathematics
PaperDynamics of the Ge(111)c(2 × 8) surface studied by scanning tunneling microscopy
- R.M. Feenstra
- G.A. Held
- 1993
- Physica D: Nonlinear Phenomena
Paper