Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- Gottlieb S. Oehrlein
- J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
3553 results for Materials Discovery
The determination of structure in small supported metal particles by scanning transmission electron diffraction
- H. Poppa
- R.D. Moorhead
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperChemical and physical modification of fluoropolymer surfaces for adhesion enhancement: A review
- Lorraine M. Siperko
- Richard R. Thomas
- 1989
- Journal of Adhesion Science and Technology
PaperEffects of deuterium plasma treatments on the electrical properties of boron-doped silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 1989
- Materials Science and Engineering B
PaperA study of the chemical and physical interaction between copper and polyimide
- D.Y. Shih
- J. Paraszczak
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperOptical emission characterization of a divergent magnetic field electron cyclotron resonance source
- John S. McKillop
- John C. Forster
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperEnergetic particle bombardment of films during magnetron sputtering
- S.M. Rossnage
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperReaction kinetics of surface silicon hydrides
- C. Michael Greenlief
- Stephen M. Gates
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperPlasma-enhanced CVD of high quality insulating films
- J. Batey
- E. Tierney
- et al.
- 1989
- Applied Surface Science
PaperA study of voids in sputtered Si02
- Mitchell J. Hait
- Harris C. Jones
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper