A Study of Luminescent Centers in Reactive-Ion-Etched Silicon
- T.D. Bestwick
- G.S. Oehrlein
- et al.
- 2019
- JES
Paper
Publications
24860 results for Exploratory Science
Investigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 2019
- JES
PaperSurface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
PaperCurrent status of reduced temperature silicon epitaxy by chemical vapor deposition
- B.S. Meyerson
- 2019
- JES
PaperEffects of oxygen on the rie characteristics of aluminum films
- S.P. Holland
- Graham Olive
- et al.
- 2019
- JES
PaperStripping Voltammetry of Nickel-Iron Films Electrodeposited on Platinum Using a Rotating Ring-Disk Electrode
- J. Tabib
- L. Romankiw
- 2019
- JES
PaperA Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
PaperA Two-Dimensional Process Model for Chemimechanical Polish Planarization
- J. Warnock
- 2019
- JES
PaperEnergy Considerations in the Deposition of High-Quality Plasma-Enhanced CVD Silicon Dioxide
- E. Tierney
- J. Batey
- et al.
- 2019
- JES
Paperlow Temperature Silicon Epitaxy by Hot Wall Ultrahigh Vacuum/Low Pressure Chemical Vapor Deposition Techniques: Surface Optimization
- B.S. Meyerson
- E. Ganin
- et al.
- 2019
- JES
Paper