Modeling polarization for Hyper-NA lithography tools and masks
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Publications
14465 results for Physical Sciences
Coupling-aware mixed dummy metal insertion for lithography
- Liang Deng
- Martin D.F. Wong
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperThe effect of photoresist/topcoat properties on defect formation in immersion lithography
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2007
- Proceedings of SPIE 2007
Conference paperA solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- Andrew J. Merriam
- Donald S. Bethune
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperHigh performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperBuilding an immersion top coat from the ground up - Materials perspective
- Mahmoud Khojasteh
- Irene Popova
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperFuture directions for CMOS device technology development from a system application perspective
- Tak H. Ning
- 2007
- SPIE Advanced Lithography 2007
Conference paperUse of starburst patterns in optical lithography
- M. Burkhardt
- Cyrus Tabery
- 2007
- SPIE Advanced Lithography 2007
Conference paperOPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- Daniel Fischer
- Mohamed Talbi
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperInitial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper