Low temperature material reaction at the Ti/Si(111) interface
- R.M. Tromp
- G.W. Rubloff
- et al.
- 1986
- JVSTA
Paper
Publications
3555 results for Materials Discovery
Effects of deposition methods on the temperature-dependent resistivity of tunasten films
- L. Krusin-Elbaum
- K.Y. Ahn
- et al.
- 1986
- JVSTA
PaperHollow-cathode-enhanced magnetron sputtering
- J.J. Cuomo
- S.M. Rossnagel
- 1986
- JVSTA
PaperCatalytic oxidation of niobium by rare earths
- Maria Ronay
- 1986
- JVSTA
PaperThe atomic structure of the NiSi2~Si(111) interface
- E.J. van Loenen
- 1986
- JVSTA
PaperReactively sputter-deposited and coevaporated TeOx thin films for optical recording
- W.-Y. Lee
- F.O. Sequeda
- et al.
- 1986
- JVSTA
PaperProperties of Cr-N films produced by reactive sputtering
- K.K. Shih
- D.B. Dove
- et al.
- 1986
- JVSTA
PaperReactive radio frequency sputter deposition of higher nitrides of titanium, zirconium, and hafnium
- D.S. Yee
- J.J. Cuomo
- et al.
- 1986
- JVSTA
PaperInteraction of metals with model polymer surfaces: Core level photoemission studies
- P.N. Sanda
- J.W. Bartha
- et al.
- 1986
- JVSTA
PaperThermal dry process soldering
- S.K. Ray
- H.L. Yeh
- 1986
- JVSTA
Paper