Properties and Microelectronic Applications of Thin Films of Refractory Metal NitridesMarc Wittmer1985JVSTAPaper
Highly selective argon-oxygen ion beam etching process for Pb alloysD.F. MooreH.P. Dietrichet al.1985JVSTAPaper
Photoemission spectroscopy study of aluminum-polyimide interfaceJ.W. BarthaP.O. Hahrtet al.1985JVSTAPaper
Summary Abstract: The interaction mechanism of inelastic electron tunneling spectroscopy probed by high resolution electron energy loss spectroscopyM. LiehrP.A. Thiryet al.1985JVSTAPaper
Effect of ion bombardment during deposition on the x-ray microstructure of thin silver filmsT.C. HuangG. Limet al.1985JVSTAPaper
Reactive sputtering of copper and silicon near the sputtering thresholdT.M. MayerJ.M.E. Harperet al.1985JVSTAPaper