22 nm technology node active layer patterning for planar transistor devices
- Ryoung-Han Kim
- Steven Holmes
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper
Publications
9271 results for Computer Science
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- Martin Burkharde
- J.C. Arnold
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperC-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperHybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperQuantitative measurement of resist outgassing during exposure
- Nicolae Maxim
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperContact mask optimization and SRAF design
- Uwe P. Schroeder
- Cyrus Tabery
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperNew approaches for deniable authentication
- Mario Di Raimondo
- Rosario Gennaro
- 2009
- Journal of Cryptology
PaperDynamic service execution in sensor networks
- Lei Chen
- Zijian Wang
- et al.
- 2009
- Computer Journal
PaperGrouped graphical Granger modeling for gene expression regulatory networks discovery
- Aurélie C. Lozano
- Naoki Abe
- et al.
- 2009
- Bioinformatics
PaperGrowth kinetics of si and ge nanowires
- S. Kodambaka
- J. Tersoff
- et al.
- 2009
- SPIE OPTO 2009
Conference paper