Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper
Publications
9289 results for Computer Science
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperQuantitative measurement of resist outgassing during exposure
- Nicolae Maxim
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperOvercoming the challenges of 22-nm node patterning through litho-design co-optimization
- Martin Burkharde
- J.C. Arnold
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperNew approaches for deniable authentication
- Mario Di Raimondo
- Rosario Gennaro
- 2009
- Journal of Cryptology
PaperDynamic service execution in sensor networks
- Lei Chen
- Zijian Wang
- et al.
- 2009
- Computer Journal
PaperGrouped graphical Granger modeling for gene expression regulatory networks discovery
- Aurélie C. Lozano
- Naoki Abe
- et al.
- 2009
- Bioinformatics
PaperGrowth kinetics of si and ge nanowires
- S. Kodambaka
- J. Tersoff
- et al.
- 2009
- SPIE OPTO 2009
Conference paperProbabilistic approaches to estimating the quality of information in military sensor networks
- Duncan Gillies
- David Thornley
- et al.
- 2009
- Computer Journal
PaperA calculus approach to energy-efficient data transmission with quality-of-service constraints
- Murtaza A. Zafer
- Eytan Modiano
- 2009
- IEEE/ACM Transactions on Networking
Paper