Silicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paper
Publications
14462 results for Physical Sciences
Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperSelf assembly in semiconductor microelectronics: Self-aligned sub-lithographic patterning using diblock copolymer thin films
- C.T. Black
- R. Ruiz
- 2006
- SPIE Advanced Lithography 2006
Conference paperAdhesion between template materials and UV-cured nanoimprint resists
- Frances A. Houle
- Eric Guyer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperPhase calibration for attenuating phase-shift masks
- Michael S. Hibbs
- Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006
Conference paperDirect determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperVinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperNumerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Conference paperInvestigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperDiagonalization methods in PARSEC
- Yousef Saad
- Yunkai Zhou
- et al.
- 2005
- Institute for the Theory of Advanced Materials in Information Technology Workshop on Computational Materials 2005
Conference paper