Self assembly in semiconductor microelectronics: Self-aligned sub-lithographic patterning using diblock copolymer thin films
- C.T. Black
- R. Ruiz
- 2006
- SPIE Advanced Lithography 2006
Conference paper
Publications
14465 results for Physical Sciences
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Conference paperDiagonalization methods in PARSEC
- Yousef Saad
- Yunkai Zhou
- et al.
- 2005
- Institute for the Theory of Advanced Materials in Information Technology Workshop on Computational Materials 2005
Conference paperStructural domains in antiferromagnetic LaFeO3 thin films
- Jin Won Seo
- Christel Dieker
- et al.
- 2006
- Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques
PaperStructural domains in antiferromagnetic LaFeO3thin films
- Jin Won Seo
- Christel Dieker
- et al.
- 2006
- Journal of Materials Research
PaperPhotochemical attachment of reactive cross-linked polymer films to Si/SiO 2 surfaces and subsequent polymer brush growth
- Matthias Beinhoff
- Jane Frommer
- et al.
- 2006
- Chemistry of Materials
PaperA domain decomposition scheme based on equivalence theorem
- Mao-Kun Li
- Weng C. Chew
- et al.
- 2006
- Microwave and Optical Technology Letters
PaperExploiting chemical switching in a diels-alder polymer for nanoscale probe lithography and data storage
- Bernd Gotsmann
- Urs Duerig
- et al.
- 2006
- Advanced Functional Materials
PaperNano-electromechanical displacement sensing based on single-walled carbon nanotubes
- C. Stampfer
- A. Jungen
- et al.
- 2006
- Nano Letters
PaperAb initio and empirical model MD simulation studies of solvent effects on the properties of N-methylacetamide along a cis-trans isomerization pathway
- Yves A. Mantz
- Helene Gerard
- et al.
- 2006
- Journal of Physical Chemistry B
Paper