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Etch Selectivity of Silicon Dioxide over Titanium Silicide Using CF4/H2 Reactive Ion EtchingSteve W. RobeyGottlieb S. Oehrlein2019JESPaper
Elimination of End-of-Range Shallow Junction Implantation Damage during CMOS Titanium SilicidationG.A. Rozgonyi2019JESPaper
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