Elimination of End-of-Range Shallow Junction Implantation Damage during CMOS Titanium Silicidation
- G.A. Rozgonyi
- 2019
- JES
Paper
Publications
26944 results for Science
High temperature process limitation on TiSi2
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- JES
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- JES
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- A. Grill
- V.V. Patel
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- JES
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- Neil L. Robertson
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- M.A. Jaso
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- JES
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- 2019
- JES
Paper