Interface state capture cross section measurements on vacuum annealed and radiation damaged Si:SiO2 surfaces
- M.J. Uren
- V. Nayar
- et al.
- 1998
- JES
Paper
Publications
509 results at JES
Use of polyaniline and its derivatives in corrosion protection of copper and silver
- Vlasta Brusic
- Marie Angelopoulos
- et al.
- 1997
- JES
PaperUse of SiBN and SiBON films prepared by plasma enhanced chemical vapor deposition from borazine as interconnection dielectrics
- W.F. Kone
- S. Cohen
- et al.
- 1997
- JES
PaperNonlinear dynamics of limiting current in the flow-modulated uniform-injection cell
- J. Antonio Medina
- Daniel T. Schwarte
- 1997
- JES
PaperHigh temperature reactive ion etching of indium-tin oxide
- Yue Kuo
- 1997
- JES
PaperAnisotropic etching of a novalak-based polymer at cryogenic temperature
- R. Hsiao
- K. Yu
- et al.
- 1997
- JES
PaperEffect of mask wall angle on shape evolution during through-mask electrochemical micromachining
- R.V. Shenoy
- M. Datta
- 1996
- JES
PaperImpact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
- I. Teerlinck
- P.W. Mertens
- et al.
- 1996
- JES
PaperWettability of polished silicon oxide surfaces
- Richard R. Thomas
- Frank B. Kaufman
- et al.
- 1996
- JES
PaperEtching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
Paper