Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 2004
- Polymer Engineering & Science
Paper
Publications
14462 results for Physical Sciences
Morphological and mechanical property studies of polymer extrudates obtained by the rotational extrusion process
- Bin Chung
- Anagnostis E. Zachariades
- 2004
- Polymer Engineering & Science
PaperWire bond behavior during molding operations of electronic packages
- L.T. Nguyen
- 2004
- Polymer Engineering & Science
PaperPhysical properties of polymers–an introductory discussion
- Thor L. Smith
- 2004
- Polymer Engineering & Science
PaperUltrafast deep UV lithography using excimer lasers
- K. Jain
- S. Rice
- et al.
- 2004
- Polymer Engineering & Science
PaperSoluble polysilanes: An interesting new class of radiation sensitive materials
- R.D. Miller
- D. Hofer
- et al.
- 2004
- Polymer Engineering & Science
PaperPolysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science
PaperBubble formation mechanism during heat treatment of polymer films cast from solutions
- Ho‐Ming Tong
- Augustus C. Ouano
- 2004
- Polymer Engineering & Science
PaperThe preparation of oriented morphologies of the thermotropic aromatic copolyester of poly(ethylene terephthalate) and 80 mole percent p‐acetoxybenzoic acid
- Anagnostis E. Zachariades
- John A. Logan
- 2004
- Polymer Engineering & Science
PaperAzide photoresists for projection photolithography
- N.J. Clecak
- R.J. Cox
- et al.
- 2004
- Polymer Engineering & Science
Paper