Publications

14467 results for Physical Sciences

Azide photoresists for projection photolithography
- - N.J. Clecak
  - R.J. Cox
  - et al.
- 2004
- Polymer Engineering & Science
Paper
Poly(4‐chlorostyrene), a new high contrast negative E‐beam resist
- - J. Liutkus
  - M. Hatzakis
  - et al.
- 2004
- Polymer Engineering & Science
Paper
Photochemical free‐volume generation in poly(methyl methacrylate) photoresists
- - William Limm
  - Mitchell A. Winnik
  - et al.
- 2004
- Polymer Engineering & Science
Paper
Polysilanes: Photochemistry and deep UV lithography
- - R.D. Miller
  - G.M. Wallraff
  - et al.
- 2004
- Polymer Engineering & Science
Paper
Bubble formation mechanism during heat treatment of polymer films cast from solutions
- - Ho‐Ming Tong
  - Augustus C. Ouano
- 2004
- Polymer Engineering & Science
Paper
Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- - C. Grant Willson
  - Hiroshi Ito
  - et al.
- 2004
- Polymer Engineering & Science
Paper
Physical properties of polymers–an introductory discussion
- - Thor L. Smith
- 2004
- Polymer Engineering & Science
Paper
Super strong polymers in planar directions
- - Anagnostis E. Zachariades
  - James Economy
- 2004
- Polymer Engineering & Science
Paper
Ultrafast deep UV lithography using excimer lasers
- - K. Jain
  - S. Rice
  - et al.
- 2004
- Polymer Engineering & Science
Paper
Strength of elastorners—a perspective
- - Thor L. Smith
- 2004
- Polymer Engineering & Science
Review