The effect of photoresist/topcoat properties on defect formation in immersion lithography
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2007
- Proceedings of SPIE 2007
Conference paper
Publications
9271 results for Computer Science
High performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperFuture directions for CMOS device technology development from a system application perspective
- Tak H. Ning
- 2007
- SPIE Advanced Lithography 2007
Conference paperContact angles & structure/surface property relationships of immersion materials 65191Q
- Linda K. Sundberg
- Daniel P. Sanders
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperOPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- Daniel Fischer
- Mohamed Talbi
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperSelf-aligned, self-assembled organosilicate line patterns of ∼20nm half-pitch from block copolymer mediated self-assembly
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperSetting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- Ian Stobert
- James Bruce
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperCoupling-aware mixed dummy metal insertion for lithography
- Liang Deng
- Martin D.F. Wong
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperInitial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperFluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper