PECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance
- Yue Kuo
- 1995
- JES
Paper
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509 results at JES
Screening of charged electrodes in aqueous electrolytes
- James N. Glosli
- 1995
- JES
PaperLow Temperature Atmospheric Pressure Chemical Vapor Deposition for Epitaxial Growth of SiGe Bipolar Transistors
- D.A. Grutzmacher
- D.A. Grutzmacher
- 1995
- JES
PaperCorrosion and Protection of a Conductive Silver Paste
- V. Brusic
- G.S. Frankel
- et al.
- 1995
- JES
PaperElectrochemical Fabrication of Mechanically Robust PbSn C4 Interconnections
- J. Roeder
- H. Deligianni
- et al.
- 1995
- JES
PaperAlloying of a Less Noble Metal in Electrodeposited Cu Through Underpotential Deposition
- Hariklia Deligianni
- I-Chia Hsu Chang
- et al.
- 1995
- JES
PaperPlasma Etching and Deposition for a-Si: H Thin Film Transistors
- Yue Kuo
- 1995
- JES
PaperThe C49 to C54 Phase Transformation in TiSi2Thin Films
- L. Clevenger
- R. Mann
- 1994
- JES
PaperX-Ray Absorption Study of Electrochemically Grown Oxide Films on AlCr Sputtered Alloys
- A.J. Davenport
- H.S. Isaacs
- et al.
- 1994
- JES
PaperHigh Selectivity Magnetically Enhanced Reactive Ion Etching of Boron Nitride Films
- Bernhard Neureither
- Son Nguyen
- et al.
- 1994
- JES
Paper