Electrode Flatness Requirements for Cathode Projection Microfabrication SystemsGeorge A. Wardly1975IEEE T-EDPaper
Reduction of Photoresist Standing-Wave Effects by Post-Exposure BakeEdward John Walker1975IEEE T-EDPaper
In-Situ Measurement of Dielectric Thickness During Etching or Developing ProcessesKarl L. KonnerthFrederick H. Dill1975IEEE T-EDPaper
Modeling Projection Printing of Positive PhotoresistsJames A. TuttleEd ward John Walker1975IEEE T-EDPaper
V–1 Laser Fabrication of Large-Area Arrays: Thin-Film Silicon Isolated Devices on Fused Silica SubstratesR.A. LaffG.L. Hutchins1974IEEE T-EDPaper
Bistable Switching and Conduction Mechanisms in Nb-Nb2O5-Bi JunctionsS. BasavaiahK.C. Park1973IEEE T-EDPaper