Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
14462 results for Physical Sciences
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
Conference paperImpact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Conference paperHardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperPolyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Conference paperUsing the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paperSelective enhancement of contrast blocks for MPEG/JPEG image compression
- Konstantin Y. Kupeev
- Zohar Sivan
- 2003
- VCIP 2003
Conference paperA Solid-State Spectral Effect in Eclipsed Tetracyanonickelates: X-ray Crystal Structure, Polarized Specular Reflectance Spectroscopy, and ZINDO Modeling of Sr[Ni(CN)4]·5H2O, Rb 2[Ni(CN)4]·H2O, and Na 2[Ni(CN)4]·3H2O
- Frank R. Fronczek
- Terry J. Delord
- et al.
- 2003
- Inorganic Chemistry
PaperPlasma-enhanced atomic layer deposition of tantalum thin films: The growth and film properties
- H. Kim
- S.M. Rossnagel
- 2003
- Thin Solid Films
PaperThe bi-directional electron pump operated in the double dot regime
- T. Altebaeumer
- H. Ahmed
- 2003
- MNE 2003
Conference paper