Extreme scaling with ultra-thin Si channel MOSFETs
- Bruce Doris
- Meikei Ieong
- et al.
- 2002
- IEDM 2002
Conference paper
Publications
14462 results for Physical Sciences
Influence of substrate temperature during sputter deposition on the subsequent formation of titanium disilicide
- A.S. Özean
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paperA functional FinFET-DGCMOS SRAM cell
- E. Nowak
- B. Rainey
- et al.
- 2002
- IEDM 2002
Conference paperMARS2: An advanced femtosecond laser mask repair tool
- Alfred Wagner
- Richard Haight
- et al.
- 2002
- SPIE Photomask Technology 2002
Conference paperExamination of hole mobility in ultra-thin body SOI MOSFETs
- Zhibin Ren
- Paul M. Solomon
- et al.
- 2002
- IEDM 2002
Conference paperPower-constrained device and technology design for the end of scaling
- David J. Frank
- 2002
- IEDM 2002
Conference paperThe role of copper-phthalocyanine in multilayer organic LEDs based on small molecules
- Heike Riel
- Tilman A. Beierlein
- et al.
- 2002
- Proceedings of SPIE 2002
Conference paperCarbon nanotube electronics
- Phaedon Avouris
- Joerg Appenzeller
- et al.
- 2002
- IEDM 2002
Conference paperA high performance 90 nm SOI technology with 0.992 μm2 6T-SRAM cell
- Mukesh Khare
- S. Ku
- et al.
- 2002
- IEDM 2002
Conference paperSub-30 nm P+ abrupt junction formation in strained Si/Si1-xGex MOS device
- K.L. Lee
- J.O. Chu
- et al.
- 2002
- IEDM 2002
Conference paper