Fast detection of novel problematic patterns based on dictionary learning and prediction of their lithographic difficulty
- F. De Morsier
- David Demaris
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paper
Publications
26878 results for Science
Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperAutomated sample plan selection for OPC modeling
- Nathalie Casati
- Maria Gabrani
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperNovel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperPrecise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperClear sub-resolution assist features for EUV
- Martin Burkhardt
- Greg McIntyre
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperMolecular glass resists for scanning probe lithography
- Christian Neuber
- Andreas Ringk
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperShort-term forecasting of cloud images using local features
- Wenhui Jiang
- Fei Su
- et al.
- 2013
- ICGIP 2013
Conference paperLeveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperTowards electrical testable soi devices using directed self-assembly for fin formation
- Chi Chun Liu
- Cristina Estrada-Raygoza
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paper