Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
Publications
3596 results for Mathematical Sciences
Characterization and mitigation of overlay error on silicon wafers with nonuniform stress
- T.A. Brunner
- V. Menon
- et al.
- 2014
- SPIE Advanced Lithography 2014
Automated sample plan selection for OPC modeling
- Nathalie Casati
- Maria Gabrani
- et al.
- 2014
- SPIE Advanced Lithography 2014
Computational lithography platform for 193i-guided directed self-assembly
- Kafai Lai
- Melih Ozlem
- et al.
- 2014
- SPIE Advanced Lithography 2014
Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2014
- SPIE Advanced Lithography 2014
Clear sub-resolution assist features for EUV
- Martin Burkhardt
- Greg McIntyre
- et al.
- 2014
- SPIE Advanced Lithography 2014
Novel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
E-beam inspection of EUV mask defects: To etch or not to etch?
- Ravi Bonam
- Hung-Yu Tien
- et al.
- 2014
- SPIE Advanced Lithography 2014