Characteristics of low-k and ultralow-k PECVD deposited SiCOH films
- A. Grill
- V.V. Patel
- et al.
- 2002
- MRS Proceedings 2002
Conference paper
Publications
14466 results for Physical Sciences
Evaluation of the chemical-mechanical planarization (CMP) performance of silicon nitride and silicon carbide as hard mask materials for Cu-based interconnect technology
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- Jia Lee
- et al.
- 2002
- MRS Spring Meeting 2002
Conference paperTexture and resistivity of Cu and dilute Cu alloy films
- K. Barmak
- A. Gungor
- et al.
- 2002
- MRS Proceedings 2002
Conference paperThe stability of triangular 'droplet' phases on Si(1 1 1)
- J.B. Hannon
- J. Tersoff
- et al.
- 2002
- Journal of Crystal Growth
Conference paperTerabit density cobalt nanowire arrays with tunable magnetic properties
- Andrei Ursache
- Mustafa Bal
- et al.
- 2002
- MRS Proceedings 2002
Conference paperThe growth of tantalum thin films by plasma-enhanced atomic layer deposition and diffusion barrier properties
- H. Kim
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paperA self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature
- G.M. Cohen
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paperCu and dilute binary Cu(Ti), Cu(Sn) and Cu(Al) thin films: Texture, grain growth and resistivity
- A. Gungor
- K. Barmak
- et al.
- 2002
- MRS Proceedings 2002
Conference paperIn-situ studies of silicide formation in Ti-Ta bilayer thin films on poly-Si
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paperMicromagnetic behavior of electrodeposited cylinder arrays
- C.A. Ross
- M. Hwang
- et al.
- 2002
- Physical Review B - CMMP
Paper