Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
24902 results for Exploratory Science
Performance of tri-layer process required for 22nm and beyond
- Yayi Wei
- Martin Glodde
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperFundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- Guillaume Landie
- Yongan Xu
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperCritical challenges for "non-critical" layers
- J.M. Gomez
- I.Y. Popova
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperRevisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperComponent rationing for available-to-promise scheduling in configure-to-order systems
- Ching-Hua Chen-Ritzo
- Tom Ervolina
- et al.
- 2011
- EJOR
PaperSingle exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperIntegrated model-based retargeting and optical proximity correction
- Kanak B. Agarwal
- Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Conference paperGaAs on 200 mm Si wafers via thin temperature graded Ge buffers by molecular beam epitaxy
- M. Richter
- Christophe Rossel
- et al.
- 2011
- Journal of Crystal Growth
PaperMicrofluidic chips for point-of-care immunodiagnostics
- Luc Gervais
- Nico De Rooij
- et al.
- 2011
- Advanced Materials
Review