Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
9271 results for Computer Science
Polyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Conference paperUsing the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paperSelective enhancement of contrast blocks for MPEG/JPEG image compression
- Konstantin Y. Kupeev
- Zohar Sivan
- 2003
- VCIP 2003
Conference paperHighly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperX-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003
Conference paperReinforcement learning with immediate rewards and linear hypotheses
- Naoki Abe
- Alan W. Biermann
- et al.
- 2003
- Algorithmica (New York)
PaperA decomposition of classes via clustering to explain and improve Naive Bayes
- Ricardo Vilalta
- Irina Rish
- 2003
- ECML 2003
Conference paperClassification approach towards ranking and sorting problems
- Shyamsundar Rajaram
- Ashutosh Garg
- et al.
- 2003
- ECML 2003
Conference paperTopic learning from few examples
- Huaiyu Zhu
- Shivakumar Vaithyanathan
- et al.
- 2003
- PKDD 2003
Conference paper