Using the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
9290 results for Computer Science
Diffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Conference paperThe estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paperDeprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Conference paperHardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperImpact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Conference paperHighly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperRational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
Conference paperPolyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Conference paperExtendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paper