Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
14466 results for Physical Sciences
Pattern characterization of deep-ultraviolet photoresists by near-field infrared microscopy
- Bogdan Dragnea
- Jan Preusser
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperDynamics of one-dimensional domain walls interacting with disorder potential
- L. Krusin-Elbaum
- T. Shibauchi
- et al.
- 2001
- Journal of Magnetism and Magnetic Materials
PaperLayout and language: An efficient algorithm for detecting text blocks based on spatial and linguistic evidence
- Matthew Hurst
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperNovel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
PaperDiffusion of 110mAg Tracer in Polycrystalline and Single-Crystal Lead-Containing Piezoelectric Ceramics
- Daniel J. Lewis
- Devendra Gupta
- et al.
- 2001
- JACerS
PaperNovel classes of cyclic olefin polymers for 193 nm lithography
- P. Rao Varanasi
- R.D. Allen
- et al.
- 2001
- J. Photopolym. Sci. Tech.
PaperSuppression of matching field effects by splay and pinning energy dispersion in YBa2Cu3O7 with columnar defects
- D. Niebieskikwiat
- A. Silhanek
- et al.
- 2001
- Physical Review B - CMMP
PaperInvited paper environmental effects on interfacial adhesion
- M.W. Lane
- J.M. Snodgrass
- et al.
- 2001
- Microelectronics Reliability
PaperAn algorithm for efficient segmentation and selection of representative frames in video sequences
- Konstantin Y. Kupeev
- Zohar Sivan
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper