Recent progress in electron-beam resists for advanced mask-making
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- IBM J. Res. Dev
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745 results at IBM J. Res. Dev
Adaptive fast path architecture
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PaperExperience with building a commodity intel-based ccNUMA system
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PaperChemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
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- IBM J. Res. Dev
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