Revisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
25370 results for Science
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- Steven J. Holmes
- Cherry Tang
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperHexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperComponent rationing for available-to-promise scheduling in configure-to-order systems
- Ching-Hua Chen-Ritzo
- Tom Ervolina
- et al.
- 2011
- EJOR
PaperSingle exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperIntegrated model-based retargeting and optical proximity correction
- Kanak B. Agarwal
- Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Conference paperGaAs on 200 mm Si wafers via thin temperature graded Ge buffers by molecular beam epitaxy
- M. Richter
- Christophe Rossel
- et al.
- 2011
- Journal of Crystal Growth
PaperMicrofluidic chips for point-of-care immunodiagnostics
- Luc Gervais
- Nico De Rooij
- et al.
- 2011
- Advanced Materials
ReviewCategorical decision making by people, committees, and crowds
- Lav R. Varshney
- Joong Bum Rhim
- et al.
- 2011
- ITA 2011
Conference paperA new class of array codes for memory storage
- Luis A. Lastras-Montano
- P.J. Meaney
- et al.
- 2011
- ITA 2011
Conference paper