Competitive and cost effective copper/low-k interconnect (BEOL) for 28nm CMOS technologies
- Rod Augur
- Craig Child
- et al.
- 2010
- ADMETA 2010
Conference paper
Publications
25370 results for Science
Domain adaptation of rule-based annotators for named-entity recognition tasks
- Laura Chiticariu
- Rajasekar Krishnamurthy
- et al.
- 2010
- EMNLP 2010
Conference paper3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- Johann Foucher
- Narender Rana
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperFuture of PECVD and spin-on low-k materials
- Geraud Dubois
- 2010
- ADMETA 2010
Conference paperAn efficient approach to detect lack of synchronization in acyclic workflow graphs
- Cédric Favre
- 2010
- ZEUS 2010
Conference paperMetallization opportunities and challenges for future back-end-of-the-line technology
- Cyril Cabral Jr.
- Benjamin Fletcher
- et al.
- 2010
- ADMETA 2010
Conference paperEvolution of stress gradients in Cu thin films induced by capping layers
- 2010
- ADMETA 2010
Conference paperPerformance variations of two open-source cloud platforms
- Yohei Ueda
- Toshio Nakatani
- 2010
- IISWC 2010
Conference paperPerformance of multi-process and multi-thread processing on multi-core SMT processors
- Hiroshi Inoue
- Toshio Nakatani
- 2010
- IISWC 2010
Conference paperQuantifying the value of rfid in air cargo handling process: A simulation approach
- Miao He
- Jacqueline Morris
- et al.
- 2010
- WSC 2010
Conference paper