Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm
- Juliann Opitz
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Conference paper
Publications
14467 results for Physical Sciences
Effective damping for rotating disks at super-critical speeds
- Fu-Ying Huang
- C.D. Mote Jr.
- 2002
- SPIE Smart Structures and Materials 2002
Conference paperWithin-chip variability analysis
- S. Nassif
- 1998
- IEDM 1998
Conference paperPhotoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
- Wu-Song Huang
- Ratnam Sooriyakumaran
- et al.
- 1998
- Microlithography 1998
Conference paperAdvanced negative resists using novel aminoplast crosslinkers
- Ali Afzali-Kushaa
- Jeffrey D. Gelorme
- et al.
- 1998
- Microlithography 1998
Conference paperProjection displays
- George Liang-Tai Chiu
- K.H. Yang
- 1998
- Photonics China 1998
Conference paperIdeas for fast and cheap object capture
- P.C.D. Hobbs
- 1997
- Photonics East 1997
Conference paperApplying statistical process control to the adaptive rate control problem
- Nelson R. Manohar
- Marc Willebeek-LeMair
- et al.
- 1998
- SPIE Photonics West 1998
Conference paperUpdates to the QBIC system
- Wayne Niblack
- Xiaoming Zhu
- et al.
- 1998
- SPIE Photonics West 1998
Conference paperPositive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Conference paper