Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Conference paper
Publications
14462 results for Physical Sciences
"Copper chip" technology
- D. Edelstein
- 1998
- Microelectronic Manufacturing 1998
Conference paperScalability of SOI technology into 0.13 μm 1.2 V CMOS generation
- E. Leobandung
- M. Sherony
- et al.
- 1998
- IEDM 1998
Conference paperApplicability of Sneddon relationships to the real case of a rigid cone penetrating an infinite half space
- J.C. Hay
- A. Bolshakov
- et al.
- 1998
- MRS Spring Meeting 1998
Conference paperDUV stability of carbon films for attenuated phase shift mask applications
- Alessandro Callegari
- Katherina Babich
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paperUse of micro-mechanical techniques, AFM and MFM to access surface deformation in multilayered thin films
- T.W. Wu
- J.E. Frommer
- 1998
- MRS Spring Meeting 1998
Conference paperInformation fusion by combining multiple features and classifiers
- J. Mao
- 1998
- ISMIP 1998
Conference paperDesign of an etch-resistant cyclic olefin photoresist
- Robert D. Allen
- Juliann Opitz
- et al.
- 1998
- Microlithography 1998
Conference paperLithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paperSpatially reduced image extraction from MPEG-2 video: Fast algorithms and applications
- Junehwa Song
- Boon-Lock Yeo
- 1998
- SPIE Photonics West 1998
Conference paper