Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paper
Publications
14467 results for Physical Sciences
Mixing of 28-THz CO2-laser radiation by nanometer thin film Ni-NiO-Ni diodes with difference frequencies up to 176 GHz
- C. Fumeaux
- Fritz K. Kneubühl
- et al.
- 1998
- Proceedings of SPIE - The International Society for Optical Engineering
Conference paperA "Container" MIB for end-to-end management of ADSL networks
- Andy G. Lean
- Frank A. Schaffa
- et al.
- 1998
- SPIE SYBEN-Broadband European Networks and Electronic Image Capture and Publishing 1998
Conference paperScalability of SOI technology into 0.13 μm 1.2 V CMOS generation
- E. Leobandung
- M. Sherony
- et al.
- 1998
- IEDM 1998
Conference paper25 nm CMOS design considerations
- Y. Taur
- C. Wann
- et al.
- 1998
- IEDM 1998
Conference paperHigh-performance sub-0.08 μm CMOS with dual gate oxide and 9.7 ps inverter delay
- M. Hargrove
- S.W. Crowder
- et al.
- 1998
- IEDM 1998
Conference paperResults of attacks on a claimed robust digital image watermark
- Gordon W. Braudaway
- 1998
- SPIE Photonics West 1998
Conference paperSubstrate designs and contacts for organic light-emitting displays
- E.I. Haskal
- H. Vestweber
- et al.
- 1998
- SPIE Optical Science, Engineering, and Instrumentation 1998
Conference paperDevice design considerations for double-gate, ground-plane, and single-gated ultra-thin SOI MOSFET's at the 25 nm channel length generation
- H.-S. Wong
- David J. Franks
- et al.
- 1998
- IEDM 1998
Conference paperReactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Conference paper