Fluorocarbon high density plasmas. VII. Investigation of selective SiO2-to-Si3N4 high density plasma etch processes
- Ying Zhang
- Gottlieb S. Oehrlein
- et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Using scanning tunneling microscopy to underst and diffraction oscillations: Fe growth on Cu(100)
- Kevin E. Johnson
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperPlasma enhanced chemical vapor deposition of TiO2 in microwave-radio frequency hybrid plasma reactor
- Young H. Lee
- Kevin K. Chan
- et al.
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperMass spectrometric studies of remote helium plasma dissociation of silane
- Joseph M. Jasinski
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperCompositional and Electrical Properties of Si Metal-Oxide-Semiconductor Structure Prepared by Direct Photoenhanced Chemical Vapor Deposition using a Deuterium Lamp
- E. Machler
- E.J. Williams
- et al.
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperElectrical transport properties of hot electrons at metal, insulator, and semiconductor interfaces
- R. Ludeke
- A. Bauer
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperSimulation of surface topography evolution during plasma etching by the method of characteristics
- Manoj Dalvie
- Satoshi Hamaguchi
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperFluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
- G.S. Oehrlein
- Y. Zhang
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperDirected sputter deposition of AlCu: Film microstructure and microchemistry
- S.M. Rossnagel
- J. Moser
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperInfrared absorption spectroscopy for monitoring condensible gases in chemical vapor deposition applications
- James A. O'neill
- Michael L. Passow
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper