Applicability of global source mask optimization to 22/20nm node and beyond
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- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
26880 results for Science
Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- Ryoung-Han Kim
- Chiew-Seng Koay
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperRaman and photocurrent imaging of electrical stress-induced p-n junctions in graphene
- Gayathri Rao
- Marcus Freitag
- et al.
- 2011
- ACS Nano
PaperAutomatic Summarization
- Ani Nenkova
- Sameer Maskey
- et al.
- 2011
- ACL 2011
TutorialSurface modification of thin film composite membrane support layers with polydopamine: Enabling use of reverse osmosis membranes in pressure retarded osmosis
- Jason T. Arena
- Bryan McCloskey
- et al.
- 2011
- Journal of Membrane Science
PaperLinear loss networks
- Petar Momčilović
- Mark S. Squillante
- 2011
- Queueing Systems
PaperLow-cost data uncertainty quantification
- C. Bekas
- A. Curioni
- et al.
- 2011
- CCPE
PaperVirtual machine images as structured data: The Mirage image library
- Glenn Ammons
- Vasanth Bala
- et al.
- 2011
- HotCloud 2011
Conference paperUnshackle the cloud!
- Dan Williams
- Eslam Elnikety
- et al.
- 2011
- HotCloud 2011
Conference paperPrivacy-sensitive VM retrospection
- Wolfgang Richter
- Glenn Ammons
- et al.
- 2011
- HotCloud 2011
Conference paper