Systematic studies on reactive ion etch-induced deformations of organic underlayers
- Martin Glodde
- Sebastian Engelmann
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
26880 results for Science
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- Steven J. Holmes
- Cherry Tang
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperComponent rationing for available-to-promise scheduling in configure-to-order systems
- Ching-Hua Chen-Ritzo
- Tom Ervolina
- et al.
- 2011
- EJOR
PaperIntegrated model-based retargeting and optical proximity correction
- Kanak B. Agarwal
- Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Conference paperSingle exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperCharacteristics of voxel prediction power in full-brain granger causality analysis of fMRI data
- Rahul Garg
- Guillermo A. Cecchi
- et al.
- 2011
- SPIE Medical Imaging 2011
Conference paperGaAs on 200 mm Si wafers via thin temperature graded Ge buffers by molecular beam epitaxy
- M. Richter
- Christophe Rossel
- et al.
- 2011
- Journal of Crystal Growth
PaperMicrofluidic chips for point-of-care immunodiagnostics
- Luc Gervais
- Nico De Rooij
- et al.
- 2011
- Advanced Materials
ReviewA new class of array codes for memory storage
- Luis A. Lastras-Montano
- P.J. Meaney
- et al.
- 2011
- ITA 2011
Conference paperCategorical decision making by people, committees, and crowds
- Lav R. Varshney
- Joong Bum Rhim
- et al.
- 2011
- ITA 2011
Conference paper