Predicting and reducing substrate induced focus error
- Bernhard Liegl
- Brian Sapp
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Publications
25370 results for Science
Toward perfect on-wafer pattern placement: Stitched overlay exposure tool characterization
- Christopher P. Ausschnitt
- Timothy A. Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperSpacer defined double patterning for sub-72 nm pitch logic technology
- Ryoung-Han Kim
- Erin McLellan
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperOverlay characterization and matching of immersion photoclusters
- Blandine Minghetti
- Timothy Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperDemonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperThe feasibility of using image parameters for test pattern selection during OPC model calibration
- Amr Abdo
- Ramya Viswanathan
- 2010
- SPIE Advanced Lithography 2010
Conference paperConcepts and experiments for optimizing wide-input streaming CRC circuits
- Andreas Döring
- 2010
- ARCS 2010
Conference paperTight bounds for delay-sensitive aggregation
- Yvonne Anne Pignolet
- Stefan Schmid
- et al.
- 2010
- Discrete Mathematics and Theoretical Computer Science
PaperOrganocatalysis: Opportunities and challenges for polymer synthesis
- Matthew K. Kiesewetter
- Eun Ji Shin
- et al.
- 2010
- Macromolecules
ReviewWildcarded identity-based encryption
- Michel Abdalla
- James Birkett
- et al.
- 2010
- Journal of Cryptology
Paper