EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paper
Publications
3606 results for Mathematical Sciences
Trainable convolution filters and their application to face recognition
- Ritwik Kumar
- Arunava Banerjee
- et al.
- 2012
- IEEE TPAMI
PaperBridging CD metrology gaps of advanced patterning with assistance of nanomolding
- Narender Rana
- Dario Goldfarb
- 2012
- SPIE Advanced Lithography 2012
Conference paperHigh order wafer alignment in manufacturing
- Michael Pike
- Nelson Felix
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperConductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Conference paperInvestigation of pattern wiggling for spin-on organic hardmask materials
- Goji Wakamatsu
- Kentaro Goto
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Conference paperDose-focus monitor technique using CD-SEM and application to local variation analysis
- Shoji Hotta
- Timothy Brunner
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperThin-film platinum nanowires as sub-wavelength bolometers
- Pauline Renoux
- Alice Beauny
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Conference paperRejoinder
- Huijing Jiang
- Nicoleta Serban
- 2012
- Technometrics
PaperClustering random curves under spatial interdependence with application to service accessibility
- Huijing Jiang
- Nicoleta Serban
- 2012
- Technometrics
Paper