CrossFlow-cross-organizational workflow support for virtual organizations
- Paul Grefen
- Yigal Hoffner
- 1999
- RIDE-VE 1999
Conference paper
Publications
9271 results for Computer Science
Supporting contract match-making
- Yigal Hoffner
- 1999
- RIDE-VE 1999
Conference paperApproach to pattern aspect ratio control
- A. Thomas
- Franz Zach
- et al.
- 1999
- SPIE Advanced Lithography 1999
Conference paperApproaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
PaperDevelopment of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
PaperExperimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperPolymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperHot electron emission lithography
- M. Poppeller
- E. Cartier
- et al.
- 1999
- Microlithography 1999
Conference paperSelection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
- Yuping Cui
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperNMR analysis of chemically amplified resist films
- Hiroshi Ito
- M.H. Sherwood
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paper