Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper
Publications
24864 results for Exploratory Science
C-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperHybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperA computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperExperimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperNew approaches for deniable authentication
- Mario Di Raimondo
- Rosario Gennaro
- 2009
- Journal of Cryptology
PaperDynamic service execution in sensor networks
- Lei Chen
- Zijian Wang
- et al.
- 2009
- Computer Journal
PaperGrouped graphical Granger modeling for gene expression regulatory networks discovery
- Aurélie C. Lozano
- Naoki Abe
- et al.
- 2009
- Bioinformatics
PaperGrowth kinetics of si and ge nanowires
- S. Kodambaka
- J. Tersoff
- et al.
- 2009
- SPIE OPTO 2009
Conference paperGating of a three-leg molecule
- Norton D. Lang
- Paul M. Solomon
- 2009
- ACS Nano
Paper