Hybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper
Publications
24904 results for Exploratory Science
22 nm technology node active layer patterning for planar transistor devices
- Ryoung-Han Kim
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- 2009
- SPIE Advanced Lithography 2009
Conference paperOvercoming the challenges of 22-nm node patterning through litho-design co-optimization
- Martin Burkharde
- J.C. Arnold
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- 2009
- SPIE Advanced Lithography 2009
Conference paperC-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
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- 2009
- SPIE Advanced Lithography 2009
Conference paperBenefits and trade-offs of global source optimization in optical lithography
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- Azalia Krasnoperova
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- 2009
- SPIE Advanced Lithography 2009
Conference paperNew approaches for deniable authentication
- Mario Di Raimondo
- Rosario Gennaro
- 2009
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- Zijian Wang
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- 2009
- Computer Journal
PaperGrouped graphical Granger modeling for gene expression regulatory networks discovery
- Aurélie C. Lozano
- Naoki Abe
- et al.
- 2009
- Bioinformatics
PaperGrowth kinetics of si and ge nanowires
- S. Kodambaka
- J. Tersoff
- et al.
- 2009
- SPIE OPTO 2009
Conference paperHigh field magneto-optical spectroscopy of highly aligned individual and ensemble single-walled carbon nanotubes
- J. Shaver
- A. Srivastava
- et al.
- 2009
- International Journal of Modern Physics B
Paper