Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
- Wu-Song Huang
- Ratnam Sooriyakumaran
- et al.
- 1998
- Microlithography 1998
Conference paper
Publications
9271 results for Computer Science
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paperColor Calibration of a Colorimetric Scanner Using Non-Linear Least Squares
- A. Ravishankar Rao
- Frederick Mintzer
- 1998
- IS&T Annual Conference 1998
Conference paperOptical lens specifications from the user's perspective
- Christopher J. Progler
- Donald C. Wheeler
- 1998
- SPIE Advanced Lithography 1998
Conference paperLithographic characteristics of 193-nm resists imaged at 193 and 248 nm
- Juliann Opitz
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Conference paperUpdates to the QBIC system
- Wayne Niblack
- Xiaoming Zhu
- et al.
- 1998
- SPIE Photonics West 1998
Conference paperAdvanced negative resists using novel aminoplast crosslinkers
- Ali Afzali-Kushaa
- Jeffrey D. Gelorme
- et al.
- 1998
- Microlithography 1998
Conference paperApplying statistical process control to the adaptive rate control problem
- Nelson R. Manohar
- Marc Willebeek-LeMair
- et al.
- 1998
- SPIE Photonics West 1998
Conference paperCSVD: Approximate similarity searches in high dimensional spaces using clustering and singular value decomposition
- Alexander Thomasian
- Vittorio Castelli
- et al.
- 1998
- Photonics East 1998
Conference paperProjection displays
- George Liang-Tai Chiu
- K.H. Yang
- 1998
- Photonics China 1998
Conference paper