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Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law
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- 2008
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- 2008
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- ICS 2008
Conference paperLactones in 193 nm resists: What do they do?
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- 2008
- SPIE Advanced Lithography 2008
Conference paperResist freezing process for double exposure lithography
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- Wu-Song Huang
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- 2008
- SPIE Advanced Lithography 2008
Conference paperManaging SLAs of heterogeneous workloads using dynamic application placement
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Conference paperSupramolecular assembly of block copolypeptides with semiconductor nanocrystals
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- Jennifer N. Cha
- et al.
- 2008
- Langmuir
Paper