Speech-activated user interfaces and climbing Mt. Exascale
- Tessa Lau
- Daniel Reed
- 2009
- Communications of the ACM
Paper
Publications
25371 results for Science
Quantitative measurement of resist outgassing during exposure
- Nicolae Maxim
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperSource optimization for three-dimensional image designs through film stacks
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperExperimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperA computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperC-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperBenefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperIntensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperOvercoming the challenges of 22-nm node patterning through litho-design co-optimization
- Martin Burkharde
- J.C. Arnold
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperHybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper