193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Conference paper
Publications
14462 results for Physical Sciences
High-aspect-ratio resist for thick-film applications
- N. LaBianca
- J. Gelorme
- 1995
- Microlithography 1995
Conference paperNonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
- Daniel Bucca
- A. Aviram
- et al.
- 1995
- Microlithography 1995
Conference paperPerformance properties of near-monodisperse novolak resins
- R.D. Allen
- K.J. Chen
- et al.
- 1995
- Microlithography 1995
Conference paperInfluence of acid generator structure on T-top formation in high-temperature bake processes for environmental stabilization
- Hiroshi Ito
- G. Breyta
- et al.
- 1995
- Microlithography 1995
Conference paperKinetics of chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1995
- Microlithography 1995
Conference paperInfluence of the carrier distribution on carrier-carrier scattering in GaAs
- J.A. Kash
- 1995
- Physical Review B
PaperOptical spectroscopy of the metal-insulator transition in NdNiO3
- T. Katsufuji
- Y. Okimoto
- et al.
- 1995
- Physical Review B
PaperStrains in epitaxial films: The general case
- P.M. Marcus
- F. Jona
- 1995
- Physical Review B
PaperDesign, fabrication, and automated testing of 32-channel integrated MSM/MESFET optoelectronic integrated circuit (OEIC) receiver arrays
- D.L. Rogers
- S. Walker
- et al.
- 1995
- SPIE Photonics West 1995
Conference paper