Evaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Conference paper
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25371 results for Science
Challenges of implementing contour modeling in 32nm technology
- Daniel Fischer
- Geng Han
- et al.
- 2008
- SPIE Advanced Lithography 2008
Conference paperOptical diagnostics for IBM POWER6 TM Microprocessor
- Peilin Song
- Stephen Ippolito
- et al.
- 2008
- IEEE ITC 2008
Conference paperOn the difference of temperature dependence of metal gate and poly gate SOI MOSFET threshold voltages
- Shu-Jen Han
- Xinlin Wang
- et al.
- 2008
- IEDM 2008
Conference paperError estimates and communication overhead in the computation of the bidomain equations on the distributed memory parallel blue gene/L supercomputer
- M. Reumann
- B.G. Fitch
- et al.
- 2008
- CAR 2008
Conference paperImprovements in accuracy of dense OPC models
- Chidam Kallingal
- James Oberschmidt
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Conference paperAnalytical model for RESET operation of phase change memory
- B. Rajendran
- J. Karidis
- et al.
- 2008
- IEDM 2008
Conference paperWhen Harry Met Harri: Cross-lingual name spelling normalization
- Fei Huang
- Ahmad Emami
- et al.
- 2008
- EMNLP 2008
Conference paper22 nm technology compatible fully functional 0.1 μm 2 6T-sram cell
- B. Haran
- A. Kumar
- et al.
- 2008
- IEDM 2008
Conference paperOn impact of dynamic virtual machine reallocation on data center efficiency
- Andrzej Kochut
- 2008
- MASCOTS 2008
Conference paper