Resist-based polarization monitoring for 193nm high-numerical aperture lithography
- Richard Tu
- Gregory McIntyre
- 2008
- Lithography Asia 2008
Conference paper
Publications
25371 results for Science
Integration of polymer self-assembly for lithographic application
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
Conference paperOn-chip timing uncertainty measurements on IBM microprocessors
- R.L. Franch
- P. Restle
- et al.
- 2008
- IEEE ITC 2008
Conference paperElectromigration reliability in nanoscale Cu interconnects
- C.-K. Hu
- L. Gignac
- et al.
- 2007
- MRS Fall Meeting 2007
Conference paperSHADOWS: Self-healing complex software systems
- Onn Shehory
- 2008
- ASE 2008
Workshop paperTransaction reordering with application to synchronized scans
- Gang Luo
- Jeffrey F. Naughton
- et al.
- 2008
- CIKM 2008
Workshop paperAddressing the disconnect between the good and the popular
- Michael Hind
- 2008
- ACM SIGPLAN Notices
PaperEffect of porogen molecular architecture and loading on structure of porous thin films
- Hae-Jeong Lee
- Christopher L. Soles
- et al.
- 2008
- Chemistry of Materials
PaperWorkload characterization of selected JEE-based web 2.0 applications
- Priya Nagpurkar
- William Horn
- et al.
- 2008
- IISWC 2008
Conference paperSLUP: A semantic-based and location-aware unstructured p2p network
- Xin Sun
- Kan Li
- et al.
- 2008
- HPCC 2008
Conference paper