Trilayer development for 193 nm immersion lithography
- Sean Burns
- Martin Burkhardt
- et al.
- 2007
- J. Photopolym. Sci. Tech.
Paper
Publications
24904 results for Exploratory Science
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- P.R. Varanasi
- W. Li
- et al.
- 2007
- J. Photopolym. Sci. Tech.
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- Shubir Kapoor
- Blair Binney
- et al.
- 2007
- IBM Systems Journal
PaperGraphene nano-ribbon electronics
- Zhihong Chen
- Yu-Ming Lin
- et al.
- 2007
- Physica E: Low-Dimensional Systems and Nanostructures
PaperCompetitive equilibrium in e-commerce: Pricing and outsourcing
- Parijat Dube
- Zhen Liu
- et al.
- 2007
- Computers and Operations Research
PaperAdvanced ion energy loss models: Applications to subnanometric resolution elemental depth profiling
- R.P. Pezzi
- P.L. Grande
- et al.
- 2007
- Surface Science
PaperCore business architecture for a service-oriented enterprise
- Nitin Nayak
- Mark Linehan
- et al.
- 2007
- IBM Systems Journal
PaperOn optimizing the selection of business transformation projects
- Naoki Abe
- Rama Akkiraju
- et al.
- 2007
- IBM Systems Journal
PaperControl of morphology orientation in lithographically patternable diblock copolymers
- Joan K. Bosworth
- Xavier Andre
- et al.
- 2007
- J. Photopolym. Sci. Tech.
PaperProvenance in databases: Why, how, and where
- James Cheney
- Laura Chiticariu
- et al.
- 2007
- Foundations and Trends in Databases
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