Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994
Conference paper
Publications
14462 results for Physical Sciences
Role of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films
- Veena Rao
- William D. Hinsberg
- et al.
- 1994
- Microlithography 1994
Conference paperImproved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
Conference paper(1) Recent developments in VUV femtosecond pulse generation; (2) proposal for a higher efficiency F2 (157-nm) laser
- J.H. Glownia
- D.R. Gnass
- et al.
- 1994
- SPIE OE/LASE 1994
Conference paperMaterials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
Conference paper0.25-μm lithography development using positive mode top surface imaging photoresist
- Douglas C. La Tulipe
- John P. Simons
- et al.
- 1994
- Microlithography 1994
Conference paperFerromagnetism and spin glass in amorphous FeZr alloys
- M. Yu
- Y. Kakehashi
- et al.
- 1994
- Materials Science and Engineering A
PaperTheoretical analysis of light-inductive forces in scanning probe microscopy
- Christian Girard
- Alain Dereux
- et al.
- 1994
- Physical Review B
PaperOne-dimensional image state on stepped Cu(100)
- J.E. Ortega
- F.J. Himpsel
- et al.
- 1994
- Physical Review B
PaperEnhancement of Curie temperature in amorphous CoY alloys
- Yoshiro Kakehashi
- Ming Yu
- et al.
- 1994
- Materials Science and Engineering A
Paper