Contact patterning strategies for 32nm and 28nm technology
- Bradley Morgenfeld
- Ian Stobert
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
3613 results for Mathematical Sciences
Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- Ryoung-Han Kim
- Chiew-Seng Koay
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperEUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperArchitecture and mechanisms of Hadoop distributed file system
- Wen-Qiang Xu
- Long-Bin Lai
- et al.
- 2011
- Dongbei Daxue Xuebao/Journal of Northeastern University
PaperA trace-based Java JIT compiler retrofitted from a method-based compiler
- Hiroshi Inoue
- Hiroshige Hayashizaki
- et al.
- 2011
- CGO 2011
Conference paperAdaptive identification in torii in the king lattice
- Yael Ben-Haim
- Antoine Lobstein
- et al.
- 2011
- Electronic Journal of Combinatorics
PaperOverlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Conference paperReconciling measurements in AFM reference metrology when using different probing techniques
- Narender Rana
- Charles Archie
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperOptimization of pitch-split double patterning photoresist for applications at the 16nm node
- Steven J. Holmes
- Cherry Tang
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperPerformance of tri-layer process required for 22nm and beyond
- Yayi Wei
- Martin Glodde
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper