Molecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
Conference paper
Publications
9271 results for Computer Science
New chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
Conference paperResist materials design: Base-catalyzed chemical amplification
- C.G. Wilison
- J.F. Cameron
- et al.
- 1993
- Microlithography 1993
Conference paperThe influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Conference paperComparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- Mark A. Hartney
- Roderick R. Kunz
- et al.
- 1993
- Microlithography 1993
Conference paperAn improved detection model for DCT coefficient quantization
- Heidi A. Peterson
- Albert J. Ahumada
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperPorting a calibrated color image across corporate boundaries
- Fred Mintzer
- Ed Pariser
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperLossy compression of palettized images
- Yung Chen
- Heidi Peterson
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperData structures and perceptual structures
- Bernice E. Rogowitz
- Lloyd A. Treinish
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperImage registration for automated inspection of printed circuit patterns using CAD reference data
- Arturo A. Rodriguez
- Jon R. Mandeville
- 1993
- Machine Vision and Applications
Paper